Institute of Fundamental Technological Research
Polish Academy of Sciences

Partners

Jerzy Smolik


Recent publications
1.  Psiuk R., Chrzanowska-Giżyńska J., Denis P., Wyszkowska E., Wiśniewska M., Lipińska M., Wojtiuk E., Kurpaska Ł., Smolik J., Mościcki T. P., Microstructural and properties investigations of tantalum-doped tungsten diboride ceramic coatings via HiPIMS and RF magnetron sputtering, ARCHIVES OF CIVIL AND MECHANICAL ENGINEERING, ISSN: 1644-9665, DOI: 10.1007/s43452-024-01050-0, Vol.24, No.239, pp.1-16, 2024

Abstract:
In this work, tantalum-doped tungsten boride ceramic coatings were deposited from a single sputtering target with the radio frequency (RF) and high-power impulse magnetron sputtering (HiPIMS) methods. Two-inch torus targets were synthesised from pure elements with the spark plasma sintering (SPS) method with a stoichiometric composition of W1-xTaxB2.5 (x = 0, 0.08, 0.16, 0.24). Films were deposited with RF and HiPIMS power suppliers at process temperatures from RT to 600 °C. The substrate heating and the energy of the ionised material impacting the substrate increase the surface diffusivity of adatoms and are crucial in the deposition process. The results of SEM and XRD investigations clearly show that the addition of tantalum also changes the microstructure of the deposited films. The coatings without tantalum possess a finer microstructure than those with 24% of tantalum. The structure of films is homogeneous along the film thickness and composed mainly of columns with a (0001) preferred orientation. Deposited coatings are composed mainly of P6/mmm α-WB2 structures. The analysis of nanoindentation results allowed us to determine that ceramic coatings obtained with the HiPIMS method possess hardness above 41 GPa and a ratio of hardness to reduced Young modulus above 0.1. The thickness of HiPIMS-deposited films is relatively small: only around 60% of the RF magnetron sputtered coatings even when the average power input was two times higher. However, it has been shown that the RF coatings require heating the substrate above 400 °C to obtain a crystalline structure, while the HiPIMS method allows for a reduction of the substrate temperature to 300 °C.

Keywords:
RF magnetron sputtering, HiPIMS magnetron sputtering, Superhard ceramic coatings, Transition metal borides, Deposition temperature

Affiliations:
Psiuk R. - IPPT PAN
Chrzanowska-Giżyńska J. - other affiliation
Denis P. - IPPT PAN
Wyszkowska E. - National Centre for Nuclear Research (PL)
Wiśniewska M. - Łukasiewicz Research Network – Metal Forming Institute (PL)
Lipińska M. - other affiliation
Wojtiuk E. - other affiliation
Kurpaska Ł. - National Centre for Nuclear Research (PL)
Smolik J. - other affiliation
Mościcki T. P. - IPPT PAN

Patents
Filing No./Date
Filing Publication
Autors
Title
Protection Area, Applicant Name
Patent Number
Date of Grant
pdf
PCT/PL2023/000046
2023-08-31
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Garbiec D., Wiśniewska M., Mościcki T. P., Smolik J., Polak S.
A method for the manufacturing of a multi-component target for magnetron sputtering, a set of tools for the manufacturing of a multi-component target for magnetron sputtering, and the sputtering target with its application for the deposition of protective coating
WO, Sieć Badawcza Łukasiewicz – Poznański Instytut Technologiczny, Instytut Podstawowych Problemów Techniki PAN, Sieć Badawcza Łukasiewicz – Instytut Technologii Eksploatacji, Politechnika Wrocławska
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445255
2023-06-17
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Garbiec D., Wiśniewska M., Mościcki T. P., Smolik J., Polak S.
Sposób wytwarzania wieloskładnikowej tarczy do rozpylania magnetronowego i zestaw narzędziowy do wytwarzania wieloskładnikowej tarczy oraz wieloskładnikowa tarcza magnetronowa i jej zastosowanie do wytwarzania powłoki ochronnej
PL, Sieć Badawcza Łukasiewicz – Poznański Instytut Technologiczny, Instytut Podstawowych Problemów Techniki PAN, Sieć Badawcza Łukasiewicz – Instytut Technologii Eksploatacji, Politechnika Wrocławska
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